Application of the magnetron sputtering technique for the deposition of niobium onto copper RF cavities for particle accelerators – Master Thesis Andrii Tsymbaliuk

Author: Andrii Tsymbaliuk ; Type of thesis: Master Thesis
Abstract: Niobium cavities will be used for super conductive particle accelerators. One of the main challenges is replacing Nb bulk cavities onto Cu cavities, sputtered by the thick Nb layer. In order to improve technology of vacuum sputtering Nb onto copper cavities, the researching work was held.
Many research institutions have studied the sputtering technology applied to complex substrates. The development of the deposition of Niobium onto copper cavities started at CERN from 1980, as a method to replace bulk cavities. Then, at Legnaro National Laboratories (LNL), since 1987 it has been studied the bias diode sputtering in order to deposit Niobium onto copper QWRs for the construction of ALPI accelerator, obtaining positives results: good film uniformity and good performance but lower deposition rates in comparison with other techniques such as magnetron sputtering technique. The magnetron sputtering is a deposition technique widely used in the thin film industry because of advantages of this method.
In the Legnaro National Laboratories were developed three different types of cavities: TESLA-type 9-cell RF cavities, Quarter Wave Resonators, 6 GHz cavities. For each type different magnetron sputtering technique is applied. The aim of the investigation is to analyse the influence of the different magnetron configurations on the Nb sputtering for every type of the developed cavities.